| Application of new empirical model to the electron beam lithography process with chemically amplified resists | |
|---|---|
| Year of publication | 1998 |
| Author | Young-Mok Ham, Ki-Ho Baik, Won-Kyu Lee, Taek Dong Chung, Kukjin Chun* |
| Journal | Jpn. J. Appl. Phys. |
| Volume | 37 |
| Page | 6761-6766 |
| Link |
http://iopscience.iop.org/issue/1347-4065/37/12S
932회 연결
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