| A new simulation model of electron beam lithography for manufacturing | |
|---|---|
| Year of publication | 1998 |
| Author | Young-Mog Ham, Won-Gyu Lee, Soo-Hwan Kim, Taek Dong Chung*, Kukjin Chun |
| Journal | J. Korean Phys. Soc. |
| Volume | 33 |
| Page | s67-s71 |
| Link |
http://www.dbpia.co.kr/pdf/pdfView.do?nodeId=NODE06315552&mark=0&useDa…
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